Microstructural effects of the substrate on adhesion strength and mechanical properties of TiN Thin Films

Muhammad Irfan *, Badaruddin Soomro, Bilal Waseem, Sumaira Nosheen and Abdul Karim Aziz

Pakistan Institute of Technology for Minerals &Advanced Engineering Materials (PITMAEM), PCSIR Laboratories Complex, Ferozepur Road, Lahore-Pakistan.
 
Research Article
International Journal of Science and Research Archive, 2020, 01(02), 022-031.
Article DOI: 10.30574/ijsra.2020.1.2.0037
Publication history: 
Received on 25 November 2020; revised on 05 December 2020; accepted on 07 December 2020
 
Abstract: 
Microstructure of base material plays an important role in adhesion strength and mechanical properties of Titanium Nitride (TiN) coating especially to increase the lifecycle of parts when in practical use. Present study covers the influence of grain size/microstructure of plain carbon steel (tailored via heat treatment) on TiN thin films deposited by physical vapor deposition (PVD) technique. Strong effect of grain size (microstructure) on adhesion strength of TiN thin films on annealed, normalized and quenched substrates have been observed. Mechanical characterization of TiN films e.g. Elastic modulus (E), Hardness (Hv), Stiffness (S) etc. have been studied via nano-indentation technique. TiN thin films failure investigation has been performed with Micro scratch testing under progressive load. Film exfoliation under critical loads has been corroborated via scanning electron microscopy (SEM). The results showed that TiN films deposited on fine microstructure substrate possess excellent mechanical properties and good adhesion strength as compared to coarser microstructure substrate. Insights of this study might be helpful in designing engineered thin films on optimized microstructures.
 
Keywords: 
TiN; PVD; Nano-indentation; SEM/EDS; Micro-scratch
 
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